Used KLA / TENCOR Archer 10 XT+ #9351476 for sale
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ID: 9351476
Wafer Size: 12"
Vintage: 2008
Overlay inspection system, 12"
2008 vintage.
KLA / TENCOR Archer 10 XT+ is a highly advanced, integrated mask and wafer inspection equipment that offers a wide range of advanced imaging capabilities. The system provides fast, accurate, on-site imaging of both wafer and optical reticles and is designed to maximize efficiency and reduce inspection time. KLA Archer 10 XT+ includes high-resolution optics, a fully automated computer-controlled alignment unit, a motorized x-y stage, and an automated focus-scanning capability. This machine is capable of imaging a 500 mm x 550 mm field of view, with up to 0.4 μm resolution per pixel. Its integrated optics modules include LED lighting, adjustable flash intensity, and variable laser intensity for optimal illumination of both wafers and mask patterns. The tool is also equipped with a unique "Perspective Compensation" tool, which enables the asset to visualize patterns down to 0.35 μm. TENCOR Archer 10 XT+ offers high-speed imaging, with throughput rates up to two times faster than any other integrated model on the market. This speed ensures fast detection and diagnosis of defects, which improve process yield and quality assurance. Internally, the equipment employs advanced software algorithms, custom built for the application, to process the images that come directly from its high-precision imaging optics. These algorithms compress the data to retain the original signal-to-noise ratio and simultaneously detect and characterize defects in the field image. The software also provides the operator with the flexibility to customize the system set-up and the ability to view high resolution images directly from the image processor. The overall flexibility and modulization of the unit ensure that it can be efficiently tailored for different mask and wafer applications. Depending on the application, a broad range of configurations can be applied to the machine. For example, aspherical and dioptric optics can be added to the tool to improve the quality of the image, and imaging systems with multiple stages can easily be configured. In short, Archer 10 XT+ is an advanced integrated mask and wafer inspection asset that offers fast throughput, high resolution, customizable configurations, and software algorithms specifically designed for mask and wafer imaging. Its advanced imaging capabilities significantly improve the ability to detect defects, significantly improving process yield and quality assurance.
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