Used KLA / TENCOR Archer 10 #9104743 for sale

KLA / TENCOR Archer 10 is an advanced optical imaging equipment designed for mask and wafer inspection. It is ideal for semiconductor applications such as critical-dimension scanning electron microscopy (CD-SEM) and is capable of measuring the critical features of integrated circuits (ICs) with a high degree of accuracy. The core of KLA Archer 10 is a unique optical lithography system that combines laser, contact, and electron beam imaging with a breakthrough automatic pattern recognition (APR) unit. This allows TENCOR ARCHER10 to achieve unprecedented accuracy and throughput in measuring extremely complex patterns. It can accurately measure devices as small as 0.1 microns and automatically identify patterns with a variety of different shapes, sizes, and features. TENCOR Archer 10 also features a high-resolution CMOS imaging machine to capture up to 8K resolution images of wafers and masks. This tool allows for an extremely high-resolution view of the substrate and defects, giving the user the ability to identify and address any issues before entering the production process. In addition, its integrated optical fault analysis (OFA) asset allows for real-time detection and assessment of wafer defects as it passes through the model. Finally, ARCHER10 also comes equipped with a powerful data acquisition equipment that can collect and synchronize up to four independent imaging sources. This system is highly efficient, making it possible to conduct in-depth investigations of a single IC, such as IC failure analysis or IC performance tuning. Overall, KLA ARCHER10 is a powerful and advanced unit designed to provide reliable, accurate and fast inspection of masks and wafers. Its combination of on-board features, highly sensitive and advanced image sensors, and its real-time pattern recognition capabilities make it a leading machine in semiconductor inspection.