Used KLA / TENCOR Archer 10 #9205450 for sale

KLA / TENCOR Archer 10 is a leading-edge mask & wafer inspection equipment used for detecting and measuring defects on photomasks, wafers and other platform-agnostic substrates. The system is loaded with advanced emissive imaging luminescence (EIL) technology and utilizes brightfield and darkfield images to detect and analyze defects with high-resolution. It provides fast, highly accurate and automated defect review, giving users unparalleled throughput and performance. KLA Archer 10 unit is designed to be effective in a range of applications and processes, working with both flat and curved surfaces. It can detect defects caused by lithography, etch, deposition, deposition patterning and dielectric damage. This results in faster and more accurate defect detection and classification, helping customers reduce their defect-related costs. The combination of high-resolution imaging, automated defect review and comprehensive defect documentation makes TENCOR ARCHER10 a powerful tool for the most demanding industrial environments. It can easily integrate with other devices such as defect-control software solutions for accurate, real-time data analysis. TENCOR Archer 10 machine is capable of quickly and accurately identifying defects through brightfield and darkfield imaging. This allows for reliable, repeatable results and quick defect analysis. Its advanced multi-die imaging ensures accuracy and speed. The tool's user-friendly software makes it easy to operate, and its advanced features ensure maximum accuracy. ARCHER10's automation suite provides easy setup and flexible data analysis, and its integrated 3D sample scanner and inspection engine enable high-throughput processing of wafers and substrates. KLA ARCHER10 also provides stunningly detailed defect images. Its software can analyze and display defects in detail, allowing users to zoom in and out to evaluate defect sizes and shapes. It also has a filter-based defect identification tool that can filter out false defects, allowing users to be sure they are seeing accurate results. Furthermore, the asset provides comprehensive defect control. Features such as defect reporting and defect analytics, as well as real-time SPC, allow users to quickly identify, classify, and monitor defect trends. Overall, Archer 10 from KLA is an advanced, high-speed mask & wafer inspection model. With its intuitive software, multi-die imaging, automated defect review and comprehensive defect control, KLA / TENCOR ARCHER10 delivers unparalleled throughput and performance for industrial environments.