Used KLA / TENCOR Archer 10 #9237503 for sale

KLA / TENCOR Archer 10
ID: 9237503
Wafer Size: 8"
Overlay measurement system, 8" SMIF.
KLA / TENCOR Archer 10 is a top-of-the line mask and wafer inspection equipment designed to provide reliable and accurate measurements of photomasks and wafers used in semiconductor fabrication. The system is able to measure very small features with a high degree of accuracy. It is also capable of performing measurement of complex three dimensional structures. The central component of KLA Archer 10 unit is a linear array of high-power light sources and efficient spectral filters which allow it to image and detect variations in light intensity and color. The machine also includes an optical tool called a 'stray light baffle', which eliminates scatter from the light sources and ensures that only the sample features are imaged. Once the sample is illuminated, the sample's features are detected and the asset can measure their size, shape and position through either a manual or automated analysis. This analysis includes detection of irregularities, such as sliver formation, as well as particle density, foreign particle defect frequency, fault characterization, and surface mapping. TENCOR ARCHER10 model also provides advanced metrology capabilities, which enable it to measure the height, width, and topography of the sample's features. It can also measure the transmission and reflectance of transparent and opaque surfaces, as well as the color and luminance of those surfaces. In addition, the equipment comes with a variety of control and data acquisition software programs that allow operators to carry out complex automated or manual measurements. It also includes a suite of analysis and imaging software, including an automated focus for detecting particles and imaging defects. Archer 10 system is equipped with a high speed vision unit, and offers a wide range of image acquisition devices and detectors to capture high resolution images of samples. The machine can also measure other characteristics, such as die-to-die uniformity, and can be used to evaluate multiple samples in a single session. With a robust design and advanced imaging capabilities, ARCHER10 is an impressive mask and wafer inspection tool that can provide reliable and accurate measurements. It offers fast, efficient, and accurate analysis, making it an ideal choice for semiconductor fabrication.
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