Used KLA / TENCOR Archer 100 AIM+ #293606200 for sale

KLA / TENCOR Archer 100 AIM+ is an advanced mask and wafer inspection equipment. It combines advanced image analysis and metrology capabilities with an optimized metrology platform and ACIS Automated Inspector System (AIS). It is designed for inspecting high precision photosensitive device masks and rigid photomask images with up to 100 megapixels in resolution. KLA Archer 100 AIM+ is optimized for fast throughput, with the ability to inspect up to 10 wafers per hour. The advanced image analysis capabilities of TENCOR Archer 100 AIM+ allow for the inspection of multiple imaging approaches. It can accommodate three-dimensional (3D), two-dimensional (2D), and sub-micron feature inspection. Additionally, Archer 100 AIM+ is equipped with a "Smart Scan" feature which enables the unit to hone in on areas of interest, such as a defect, to minimize data collection and processing times. The AIS feature of KLA / TENCOR Archer 100 AIM+ is capable of inspecting a wide variety of photomask shapes and sizes. It is designed to detect particle contamination, defects, scratches and etching, amongst others. Additionally, it can identify various defects on the wafer, without affecting the wafer's performance. KLA Archer 100 AIM+ also includes an advanced metrology platform. This platform gives users the ability to measure the shape and size of critical photomask structures for process monitoring and control. The metrology platform is flexible and can be tailored to the customer's individual requirements. It also features automated data collection and data analysis capabilities. TENCOR Archer 100 AIM+ is also designed with worker safety in mind. A closed loop Human Machine Interface (HMI) is included which allows control of all functions in the machine. The HMI is designed with several viewpoints and layouts in order to satisfy the ergonomic needs of operators. Additionally, a range of alerts are present in order to ensure personnel safety. Overall, Archer 100 AIM+ is an advanced mask and wafer inspection tool which is optimized for fast throughput, with advanced image analysis and metrology capabilities. Its ergonomic design corresponds to the safety of personnel and ensures accuracy in data collection and analysis. KLA / TENCOR Archer 100 AIM+ is an ideal choice for inspecting high precision photosensitive device masks and rigid photomask images.