Used KLA / TENCOR Archer 100 #9221534 for sale

KLA / TENCOR Archer 100 is an advanced mask and wafer inspection equipment designed to ensure the quality of semiconductors. This system uses advanced metrology technology to detect defects on masks and wafers with high precision to a resolution of 0.05 µm over the full field of view, at a speed of up to 24 linear field of view (LFOV) per second. The unit utilizes a unique combination of two technologies for visualization and analysis of the surface of a wafer: patented hyperspectral imaging and spectral diffraction imaging. The spectral diffraction imaging enables detection of crystalline defects at a resolution of 0.05 µm, as it exploits differences in electron diffraction patterns selectively absorbed by different crystal structures. Hyperspectral imaging, on the other hand, uses visible light to detect and characterize defects. The combination of imaging techniques results in increased effectiveness in defect recognition, providing accuracy and repeatability of defect characterization. KLA Archer 100's design is optimized for maximum efficiency and flexibility, with advanced features like a high-contrast LED illumination station and intuitive software. The LED-based illumination station maximizes the uniformity of illumination across the full field of view of the microscope, along with providing greater contrast of features that are not visible in traditional microscopes. In addition, KLA intuitive software platform makes the machine very user-friendly, able to be adapted to different applications, including wafer Edge Mapping, Defect Assignment, Particle Count Analysis, and Bokeh Analysis. The tool also has a wide range of accessories and options available, further expanding its usability range. These options include a full range of high-resolution objectives and illumination solutions, an extensive range of filters, an in-line reference marker, and an automated alignment tool. Overall, TENCOR Archer 100 is an excellent tool for effective mask and wafer inspection, providing high speed and accuracy for both research laboratories and production lines. Its combination of advanced imaging and analysis technologies, together with the innovative design features, make it an outstanding choice for the quality assurance of semiconductor wafers.