Used KLA / TENCOR Archer 200 AIM #9176636 for sale

KLA / TENCOR Archer 200 AIM mask & wafer inspection equipment is a precision lithography tool used to detect defects in 200mm manufactured semiconductor products. This tool utilizes brightfield imaging, dark field imaging and scatter light imaging to accurately detect variations in optical transmissibility and reflectivity of patterned features. The system is capable of capturing high resolution images of each feature to analyze for defects such as pattern or open/shorts. This allows for a full inspection of litho pattern features and helps to ensure that high-quality end products are being produced. KLA Archer 200 AIM unit features two automated subsystems: the Automated Mask Inspection (AMI) subsystem and the Automated Wafer Inspection (AWI) subsystem. These two systems work together to give a full view of the lithography process. The AMI analyzes the patterns and any defects on the photomask before the wafer is exposed. This allows for early detection of any potential issues that might arise during the lithography process. The AWI inspects the patterned wafer after it has been exposed and developed. This allows for more detailed inspection of the patterns, as well as measuring any possible discrepancies between the expected pattern and the actual results. TENCOR Archer 200 AIM machine offers a number of advantages that help to reduce the cost of semiconductor production. First, the tool can inspect masks and wafers in a single pass, allowing for faster production throughput. Second, the asset offers semi-automatic defect review, so there is no need to manually inspect and identify every defect. Also, the model offers a wide variety of imaging and analysis capabilities, including the ability to measure pattern profiles and line widths, as well as the ability to detect cracks and other defects. Finally, the equipment has the ability to inspect wafers at up to 140 wafers per hour. In conclusion, Archer 200 AIM mask & wafer inspection system is a powerful tool for detecting and analyzing defects in lithography processes. This unit offers superior imaging capabilities and a variety of useful automated analysis functions. Additionally, its high throughput allows for faster production and reduced costs, making it an ideal choice for 200mm semiconductor production.