Used KLA / TENCOR Archer 200 AIM #9245432 for sale

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ID: 9245432
Wafer Size: 12"
Vintage: 2010
Overlay measurement system, 12" 2010 vintage.
KLA / TENCOR Archer 200 AIM is a dedicated mask and wafer inspection equipment designed to support advanced 0.25um and 0.15um feature sizes. It is capable of effectively inspecting fine-line features and is capable of highly accurate measurements and reporting. The system is built around a series of optical inspection technologies with a fast, automated data collection and analysis unit at its core. KLA Archer 200 AIM is a modular machine with the option of multiple inspection modules, enabling customers to configure an optimal solution for their specific needs. The tool is capable of detecting a broad range of defects including contaminate particles, gross critical dimension (CD) error, pinholes, pattern defects, missing layers, particles, resist bleed, among a few others. The asset is composed of two main components; an Image Capture Station (ICS) and a Measurement Model. The ICS is an optically aligned inspection tool with automated wafer alignment, scanning, and image capture capabilities. It is designed to allow operators to quickly and accurately scan the wafer, with the end goal of obtaining a 'clean' image with no sub-resolution defects visible. The equipment also features a powerful integrated inspection software which is designed to quickly identify and alert operators of any irregularities or potential issues. The Measurement System is a programmable unit with a powerful suite of integrated software tools designed to inspect and analyze data. The Measurement Machine comes with a library of algorithms and rules designed to identify and quantify potential defects, as well as provide detailed reports. The tool is designed to provide optimal efficiency; making sure that no time is wasted on repeated manual reviews or redundant measurements. TENCOR Archer 200 AIM is a high-speed asset ideal for production-level applications. By combining reliable data analysis and fast, automated image capture and analysis, the model provides a comprehensive solution for mask, wafer, and BRs inspection. Additionally, it is a scalable equipment allowing customers to configure systems to meet peak demand without jeopardizing quality.
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