Used KLA / TENCOR Archer 200 AIM #9407129 for sale

KLA / TENCOR Archer 200 AIM is a powerful mask and wafer inspection equipment designed for use in semiconductor manufacturing processes. KLA Archer 200 AIM has been designed for optimum performance and reliability for efficiently inspecting microelectronics components. TENCOR Archer 200 AIM is a high-end, automated, insitu mask inspection system that is capable of inspection of the finest structures and materials such as those used in semiconductor processes. This unit utilizes the latest imaging technologies, automated defect detection and review technologies, and pattern recognition to accurately and quickly detect and identify defects on complex patterns. Archer 200 AIM also has a broad spectrum of illumination capabilities that can be tailored to analyze any type of defects or material, such as: brightfield, darkfield, UV inspection, as well as LED backlighting, tilt/rotation, and side scatter inspection. The machine includes advanced software which can be used to perform a variety of analysis tasks, including defect detection and mapping, in-die mapping, process yield analysis, and defect characterization. The software also allows for a variety of image comparisons, such as between-lot inspections, measurement of critical dimensions, darkfield subsurface imaging, and the ability to detect non-visible defects. This can be used to quickly identify root cause problems, reduce overall process cycle time, and increase product yields. KLA / TENCOR Archer 200 AIM can also be integrated with other software and hardware systems to enable a comprehensive view of the process. This can include software from virtual metrology systems and quality control systems, as well as hardware automation components, such as robots and warehouse systems. Additionally, KLA Archer 200 AIM provides ergonomic features such as automated handling and setup, curved displays, and improved access to tool controls. Overall, TENCOR Archer 200 AIM is an advanced mask and wafer inspection asset designed for the highest performance mask inspection requirements. It is capable of quickly and accurately detecting a wide range of defect types and performs various analysis tasks to help increase the process yields and reduce process cycle time. The model also provides excellent ergonomics and can be easily integrated with other software and hardware components to enable a comprehensive view of the process.