Used KLA / TENCOR Archer 300 #293760734 for sale

KLA / TENCOR Archer 300 is a mask and wafer inspection equipment designed to provide precise analysis of lithography process performance on advanced semiconductor devices. This system offers comprehensive 2D or 3D imaging capabilities, as well as enhanced imaging capabilities to detect edge placement variations, sub-resolution features, and critical material-film interactions. KLA Archer 300 unit is a hardware platform that can incorporate high-speed laser pattern imaging, automated optical inspection, mask inspection, and film inspection to analyze integrated circuits. TENCOR Archer 300 utilizes AccuMetrix™ and MultiRes™ technology which provides advanced edge and verify technology that combines high-resolution imagery with AccuMetric pattern matching software to detect defects in complex patterns with ease. With its enhanced depth of focus and patented imaging techniques, Archer 300 is able to detect and identify defects more accurately and faster than conventional visualization systems. This state-of-the-art machine has improved critical dimension measurement capabilities and optimized process control for superior yield control. KLA / TENCOR Archer 300 has the capacity for 3D images with pixel resolutions up to 20nm and height resolution up to 10nm, and improved sample throughput with up to 178 wafers scanned in a single day. KLA Archer 300 also has the ability to support up to 128 wafers simultaneously, providing high-speed data throughput. TENCOR Archer 300 is also equipped with advanced mapping and film inspection technologies including MultiColor™ technology to inspect more than one key metrology feature at the same time. It also includes Absolute Overlay™ tools that measure overlay performance and demonstrate consistency of overlay performance between multiple layers. Additionally, the tool includes an integrated micromask inspection capability which allows automatic analysis of mask features to eliminate errors or defects. Archer 300's advanced asset design also includes a powerful data acquisition, analysis, and communication software package with reporting capabilities, which gives users the power to control, analyze and validate process parameters. The comprehensive analysis, reporting, and messaging capabilities give users the confidence to proactively intervene to improve process performance. KLA / TENCOR Archer 300 is an advanced, reliable, high performance model that maximizes accuracy, throughput, and data analysis to help users meet their lithography process control objectives. This best-in-class mask and wafer inspection solution enables users to achieve maximum process stability and device fabrication yield.