Used KLA / TENCOR Archer 300 #293800548 for sale

KLA / TENCOR Archer 300 is an advanced mask and wafer inspection equipment designed to optimize photomask, wafer, and reticle quality control. It is equipped with the latest imaging technology and provides total optical inspection to identify and analyze defects on photomasks, lithography wafers and reticles with high accuracy, speed, and repeatability. The system provides quick and accurate indexing and inspection of the entire photomask or wafer with no contact - allowing immediate feedback to identify and analyze defects. Additionally, users can adjust the inspection settings to even further optimize the accuracy and speed of the inspection process. KLA Archer 300 features a 4 megapixel image sensor and a high-precision XY tilt stage, providing high resolution images that accurately identifies defects including small particles, thin residues and other anomalies usually found below 10 nanometers. The unit can check the entire mask or wafer in real time, capturing information that covers the widest possible range. Additionally, TENCOR Archer 300 allows users to set thresholds for specific types of defects, which can be applied to subsequent re-inspections. The machine also offers automated rule-based repair of wafer lithography via intelligent defect recognition. The repair process is completed in a matter of minutes instead of hours, resulting in increased production throughput and improved yield. With Archer 300, users can easily review results, including a defect list, mask print images, feature dimensions, and other measurement data for accurate analysis and assessment. Overall, KLA / TENCOR Archer 300 is an ideal tool for inspecting and measuring photomasks and wafers, providing accurate, repeatable, and reliable results for ensuring optimal quality control.