Used KLA / TENCOR Archer 300 #9258489 for sale

KLA / TENCOR Archer 300 is a fully automated mask and wafer inspection equipment. It is designed to detect defects in both printed and etched surfaces of masks and wafers with extreme accuracy. It features an advanced defect detection algorithm and a high-resolution imaging system that make the most of the unit's sensitivity in the nanometer range. KLA Archer 300 includes an optical inspection station, a wafer inspection station, and a scanning station. The optical inspection station is composed of a high-resolution DUV microscope and camera. The machine uses multiple illumination angles and a set of advanced algorithms to detect and analyze defects. For wafer inspection, the tool is equipped with a high-speed, high-sensitivity, and high-resolution wafer imaging asset. The scanning station is used to rapidly scan multiple masks or wafers and quickly detect defects. TENCOR Archer 300 supports a wide variety of mask and wafer types as well as advanced defect standards including EUV, E-beam, 248nm DUV, 193nm DUV, and 157nm DUV. The model is capable of simultaneously inspecting both masks and wafers, and can also generate quick mid-cycle defect analysis reports. For maximum accuracy, Archer 300 employs advanced fault-tolerant imaging techniques. It also supports multiple types of defect algorithms in order to meet the needs of different customers. The equipment works with any type of metrology system, and can also be adapted to other types of inspection systems. Finally, KLA / TENCOR Archer 300 is highly economical thanks to its low cost of ownership. It features a long-lasting LED light source that can last up to 5 years, and its low power consumption ensures that it has easily replicable energy savings. Additionally, the unit requires only minimal maintenance - meaning that it's built to stand the test of time.