Used KLA / TENCOR Archer 300 #9287998 for sale

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ID: 9287998
Wafer Size: 12"
Vintage: 2010
Overlay measurement system, 12" (3) FOUP (3) Load ports frontend GEM / SECS and HSMS E84 Enabled for OHT and AGV / RGV (3) PIO Devices for OHT E87 (Based on E39) E40 / E94 / E90 CMP Measurement option (3) Advantag Radio Frequency (RF) Carrier ID readers Signal tower Manual included Does not include Hard Disk Drive (HDD) S2 and CE Marked 2010 vintage.
KLA / TENCOR Archer 300 is a mask and wafer inspection equipment designed to provide superior automated yield and performance analysis. KLA Archer 300 utilizes advanced image recognition algorithms to detect, analyze, and classify defects in both mask and wafer patterns used in semiconductor manufacturing. The system is capable of detecting both topographical as well as parametric anomalies in over 13 million sites per hour. These sites are scanned in order to detect and accurately correct any discrepancies between the mask and wafer patterns. It can also perform advanced analysis of various defect types, such as line narrow or bridge failures. TENCOR Archer 300 is engineered to exceed the highest standards of accuracy and performance. By taking advantage of the latest imaging technology, the unit is able to detect and analyze defects down to the micron level. Its advanced pattern recognition algorithms are able to recognize the smallest deviations from the ideal pattern, resulting in faster time to results and higher yield rates. In addition, KLA intuitive software allows for seamless customization of test parameters and results presentation. Using a user-friendly graphical interface, users can quickly define the parameters of their test and create customizable reporting. This enables users to analyze and report defects and stratifications faster than ever before. Archer 300 is especially useful for ground-breaking next-generation technology nodes. It is able to monitor and analyze the most complex and densely packed wafer patterns, allowing for accurate detection of minute defects related to multi-patterned designs. The machine is also capable of monitoring the effects of process variation and its impact on mask and wafer performance over time. KLA / TENCOR Archer 300 is a powerful and reliable tool for monitoring and analyzing mask and wafer defects during semiconductor manufacturing. It offers unparalleled accuracy and control, allowing for more accurate analysis with faster turnaround times. By utilizing the latest imaging and pattern recognition technologies, KLA Archer 300 helps users maintain a higher yield rate while reducing the time and cost associated with test and analysis.
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