Used KLA / TENCOR Archer 300 #9301024 for sale

KLA / TENCOR Archer 300 is a mask and wafer inspection equipment designed to deliver high-precision monitoring and defect detection on semiconductor devices. It is tailored for optimal performance in production lines and offers high throughput and robust reliability for mass production. The core of KLA Archer 300 is its powerful imaging technology. The system uses advanced pulse-train based optical technology to provide 17 µm pixel achievement, which enables sub-15 µm defect detection, making it suitable for the most demanding applications. The 3600 imaging architecture provides a 4X increase in resolution compared to competing systems. TENCOR Archer 300 has a multi-angle, dual-mirror optical head which provides higher resolution and better surface coverage than single-array systems. The unit also features a unique multiple-focal-length feature which is used to optimize detection reliability by automatically focusing on the nearest features. Archer 300 also features high-definition visualization capabilities. This includes a visualization subsystem which ensures accurate interpretation and annotation of high-contrast defects. The machine supports both a high-performance portable monitor and a dedicated remote interactive visualization workstation. In addition, KLA / TENCOR Archer 300 supports both standard and automated wafer mapping using KLA latest algorithm. This ensures quick and efficient process control and the ability to quickly adjust recipe settings. The tool also supports offline process monitoring, enabling continuous process monitoring without product delivery. KLA Archer 300 is a robust and reliable production solution that is designed to last. The asset provides redundancy with a dual-electrode and dual-stage reticle model, allowing for quick fault recovery and improved equipment availability and performance. The system also provides proactive monitoring and maintenance for maximum unit uptime and efficiency. In conclusion, TENCOR Archer 300 mask and wafer inspection machine delivers superior image quality, high-resolution imaging and precise defect detection. The tool also supports automated wafer mapping, offline process monitoring and robust redundancy. It is the perfect solution for high-precision monitoring and defect detection on semiconductor devices.