Used KLA / TENCOR Archer 500 AIM #293653553 for sale

KLA / TENCOR Archer 500 AIM is a mask and wafer inspection equipment that is capable of making 3D surface scans of small components. The system is equipped with high-resolution optics, advanced algorithms, and a versatile tracking unit to ensure consistent and accurate imaging. This machine is able to detect small defects across a broad spectrum of mask and wafer structures, including man-made structures, structures found in microelectronics, and other very small components. The mask & wafer inspection tool utilises advanced, high-resolution optical components that are specially designed to allow the asset to detect small defects that traditional optical microscope could not. It is uniquely capable of understanding the 3D structure of the inspected sample due to its powerful optical model and complex machine vision algorithms. This allows it to scan an entire sample or any part of it in three dimensions. Moreover, the equipment utilizes an innovative tracking system that makes sure each movement of the sample is accurately captured. The unit has a very fast inspection cycle time, specifically designed for high-speed wafer utilization, which makes it attractive for a range of different applications. Additionally, it utilizes a unique Smart Pattern Recognition software, which enables it to detect any narrow defects that may have gone undetected by regular optical microscopes. It is also equipped with a user friendly graphical interface which makes it easy to use and reduces inspection time. The machine is designed to be very user-friendly and cost-effective. On top of that, it is designed in such a way that the tool is self-learning, meaning that it can detect small defects in a fraction of the time compared to traditional methods. Furthermore, the magnetic drive systems of the asset helps reduce vibration, which reduces the rate of false alarms significantly. In conclusion, KLA Archer 500 AIM is a versatile and highly sophisticated model designed to detect small mask and wafer defects. It is capable of making 3D scans quickly and detecting very small defects due to its advanced optics, sophisticated algorithms and tracking equipment. Its user friendly graphical interface, cost effectiveness and self-learning algorithms make it a great asset for any mask and wafer inspection system.