Used KLA / TENCOR Archer A500 AIM #293592354 for sale

KLA / TENCOR Archer A500 AIM
ID: 293592354
Overlay inspection system.
KLA / TENCOR Archer A500 AIM is a multispectral imaging equipment designed for the automated inspection of advanced integrated circuit wafers and masks. This automated inspection system utilizes a three-color multi-frequency CCD camera that captures high-resolution images of both the front and back of a mask or wafer. It combines advanced image processing algorithms with total-dose X-ray inspection to identify various defects such as contamination, particle defect, and missing defects. The Archer A500 features a self-contained automated defect review unit complete with a 19-inch touchscreen interface. It has a 900x900 pixel image capture capability, which optimizes the machine's performance when detecting particles, particles in high density areas, and pattern defects. The high-speed motion platform allows for complete wafer or mask coverage in just a few minutes. The Archer A500 is equipped with an advanced multi-temporal pattern recognition module that enables it to accurately distinguish features such as particles, contacts, lines, and other features down to their individual shapes and sizes. This module has a superior 10 nanometer image resolution capability, which improves defect detection performance. The tool also includes an automated defect classification asset which utilizes cumulative defect metrics to accurately identify data-driven classification defects. This model can detect defects such as missing polarity marks and open/short routing contacts. The Archer A500's automated defect review and testing equipment provides flexibility, easy setup, and fast cycle times. The patented image-processing algorithms capture a full preview of defects, with maximum throughput and low rejection rates. The Archer A500 has several unique benefits compared to traditional manual inspection systems. It offers improved process control, improved cycle times, and improved defect control. Additionally, it provides an improved understanding of defect types and yield control, making it an ideal solution for advanced IC wafer and mask inspection.
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