Used KLA / TENCOR Archer AIM MPX #9016583 for sale
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ID: 9016583
Wafer Size: 12"
Advanced optical overlay metrology system, 12"
Install Type: Stand-Alone
Brooks Pre-Aligner
Mini-Environment w/HEPA Filter
MPX Focus/Exposure Option (PN: 0047028-000)
300mm Reflective Host Chuck (PN: 0022143-002)
Coherence Probe Interface Microscope
Measures BIB & AIM Grating Targets
Y2K Ready
Automatic Arrayed Target Measurement SW
Cassette Interface:
(2) Asyst IsoPort 300mm Load-ports
PN: 9700-9129-01 rev J
Robot Handler: Brooks
3-Axis, Single Arm, Single Blade
Software:
Win NT OS
Archer AIM Starter Kit w/ RDM Server Upgrade
User Interface:
Monitor: Viewsonic VG181 LCD 19”
3.5” (1.44MB) Floppy Drive
Mitsubishi P91D Thermal Printer
Yamaha CD-R/W Drive
SSD Back-up Drive (DAT)
Keyboard/Mouse/Trackball
Currently crated and stored in a warehouse.
KLA / TENCOR Archer AIM MPX is a state-of-the-art mask & wafer inspection equipment designed to meet the needs of microelectronic manufacturers. This system is capable of providing high-resolution imaging for detecting and analyzing a variety of defects on both masks and wafers. KLA Archer AIM MPX is designed to ensure a high degree of yield optimization and delivery of accurate defect images. It combines a compact design with an advanced, high-speed imaging architecture that delivers improvements in inspection throughput. At the heart of the unit is a full-color, High Resolution Imager(HRI) and advanced optics that enable higher resolution images and faster analysis. TENCOR Archer AIM MPX is able to detect and analyze particle defects, as well as manufacturing defects such as local voltage changes, bridged droplets, and unsupported features. It is also capable of zooming in on high-voltage areas of a mask or wafer, enabling detection of potentially catastrophic defects. The machine offers superior contrast sensitivity for enhanced defect detection and analysis. Archer AIM MPX also includes a Thermal Control & Stability tool (T-C&S) that maintains precise, repeatable temperatures during wafer inspection for enhanced defect detection performance. This asset allows for minimal product variation from lot to lot, and provides improved detection accuracy for low-contrast and high-sensitivity defect types. KLA / TENCOR Archer AIM MPX provides a range of user-selectable imaging modes, making it highly versatile and enabling users to tailor the model to their specific needs. Examples of the imaging modes include Low Contour Scan, Low Contrast SLF, High Resolution SLF and Low Contrast Edge Enhanced. KLA Archer AIM MPX also includes software-based AutoSensitization for automated brightness and contrast selection, which simplifies the user's setup process and reduces the number of times the user must interact with the equipment. In addition, the system is capable of producing data export formats, such as ASCII, BMP, TIFF, PDF and JPEG, for quick and easy reporting. As a high-end systems, TENCOR Archer AIM MPX is able to generate defect images quickly and accurately, enabling manufacturers to optimize yields, reduce costs, and improve product quality. This unit is ideally suited for a wide variety of production environments, providing the capability for high-speed imaging and reliable defect detection.
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