Used KLA / TENCOR Archer AIM MPX #9239066 for sale

KLA / TENCOR Archer AIM MPX is a mask and wafer inspection system designed for advanced metrology and yield management in the semiconductor fabrication process. It utilizes image-based technology to determine the quality of critical feature measurements on wafer surfaces, enabling manufacturers to create higher performance, more reliable wafer devices faster and with greater accuracy. At the core of KLA Archer AIM MPX is its proprietary Multi-Dimensional Visualization Technology (MDVT) which enables the system to detect and identify the smallest imperfections that may otherwise go unseen in conventional imaging systems. By combining a high-end image vector processor, an advanced illumination system, and patented optical components, TENCOR Archer AIM MPX is able to capture up to forty-six images per second in high-resolution. It utilizes multiple independent imaging channels, allowing it to perform rapid inspection and scanning on a single wafer or multiple wafers simultaneously. This parallelism enables Archer AIM MPX to measure and inspect features on entire wafer surfaces within seconds, without introducing any artifacts into the image. In addition, its self-docking design allows for easy and quick loading and unloading of wafers allowing manufacturers to quickly optimize the inspection process. KLA / TENCOR Archer AIM MPX is designed to meet the highest levels of precision and accuracy, with its ability to analyze features down to 50nm and detect defects at 1mil positional accuracy. Furthermore, it provides automated defect classification and sophisticated false positive detection capabilities allowing it to identify real defect but reduce false positives. In addition, KLA software suite accompanying KLA Archer AIM MPX delivers powerful analytics and data visualization tools, allowing for enhanced data analysis for process optimization and automation of yield analysis. As a result, TENCOR Archer AIM MPX allows for rapid reticle and photomask inspection and wafer-level metrology, providing unprecedented insight into production yields and manufacturing cost savings.