Used KLA / TENCOR Archer AIM MPX #9383055 for sale

KLA / TENCOR Archer AIM MPX is a mask and wafer inspection equipment that enables automated production-ready inspection of both critical and non-critical features on photomasks and wafers. This system incorporates advanced technologies such as the Optimode capability, a patented 4-Dimensional (4D) laser scatterometry workflow, and multiple pattern recognition techniques to ensure that all defects are reliably identified and reliably measured. The Optimode capability ensures that all features on the mask or wafer being inspected are precisely identified and measured. It works by controlling the laser spot size and the number of scans requested. Laser scatterometry measures the complexity of die shapes and 3D features, allowing the measurement of high-contrast features on both flat and complex surfaces without the need for human interaction. In addition to the Optimode technology, KLA Archer AIM MPX is equipped with multiple pattern recognition techniques to ensure accurate inspection results. This includes a dynamic defect detection, auto-threshold selection, and an auto-configurable feature template library. Furthermore, this unit provides inspection reports in various formats, such as JPEG, TIFF, and PDF, with up to 500x magnification. TENCOR Archer AIM MPX machine supports a variety of growth and overlay processes such as High Volume Manufacturing (HVM), enabling the tool to accurately measure features down to a resolution of 0.1 micron. Furthermore, this asset operates in a completely dark ambient environment and maintains a consistent thermal profile, enabling ultra-high precision measurements. In addition, Archer AIM MPX also offers a wide array of inspection modes, including review, spot, comparison, overlay, and low-k. Review mode provides a viewable representation of the mask or wafer, while the comparison mode compares masks side by side to evaluate non-conformances. The overlay mode aligns multiple masks for quick inspection, while low-k mode is capable of measuring the features' height and thinfilmlines. Overall, KLA / TENCOR Archer AIM MPX is a reliable mask and wafer inspection model that offers an optimal combination of features, allowing fast and accurate defect detection, identifying potential yield losses, and enhancing fabrication accuracy. With its powerful features, inspection time is reduced and productivity is increased.