Used KLA / TENCOR Archer AIM #293597091 for sale

KLA / TENCOR Archer AIM is a leading-edge mask and wafer inspection equipment designed to deliver superior edge-placement accuracy and defect detection. This automated product provides advanced capabilities for monitoring critical process steps during wafer fabrication and ensuring the highest yield in wafer metrology and defect detection. With its simplified user interface and automated inspection routines, KLA Archer AIM enables easy integration, setup and operation of the system, allowing manufacturers to better and more quickly address a variety of wafer-level advancements and defects. TENCOR Archer AIM utilizes a combination of automated inspection, enhancing and correlation techniques to identify defects and yield anomalies, allowing manufacturers to quickly identify critical process steps that may be producing yield or quality issues. Furthermore, the unit's advanced digital pattern recognition and high-quality imaging generate results with an unmatched accuracy and repeatability. The machine also utilizes a Scanning Electron Microscope (SEM) to detect even the smallest of defects, as it provides high-resolution images of the wafer with a precisely tailored illumination pattern. In addition, it can be used to inspect all types of masks, including photomask and reticle, as well as devices with multiple layers. The tool's modular design provides users with a range of options to tailor their asset according to their down-stream requirements. In general, users can expect automated and manual scaling and offset adjustments, precision pattern recognition, highly accurate defect location and classification, multiple language and region/character recognition capability, and a comprehensive report generator. Archer AIM provides higher throughput inspection speeds, greater wafer-level coverage, better throughput and enhanced repeatability for mask inspection. This model not only helps to improve yield but also reduces cycle time and ensures that customers have fewer rework costs associated with mask correction. The cost effectiveness of the equipment is also due to its low power consumption and modular design. Overall, KLA / TENCOR Archer AIM is a comprehensive and advanced wafer metrology and defect detection system that is designed to reduce cycle time, increase yield and keep rework costs low. Its precision imaging capabilities and automated inspection functions can help to ensure that customers are manufacturing the highest quality products with the best results.