Used KLA / TENCOR Archer AIM+ #293603929 for sale

KLA / TENCOR Archer AIM+ is a market-leading mask & wafer inspection equipment that helps semiconductor manufacturers improve process yields and reduce cost. It accurately detects even the most minute defects across a wide range of mask and wafer test types and enables process engineers to quickly react to yield-affecting defects. The system combines innovative optical and imaging algorithms with advanced physics-based pattern recognition. The camera on KLA Archer AIM+ is a dual-axis selective-area monitor, which accurately acquires data simultaneously from both wafer and mask components. It is capable of capturing images of up to 4,000 x 4,000 pixels with sub-micron resolution and accuracy. To further enhance image capture, the unit features an intelligent parameter optimization machine that adjusts the optics for optimal results within a shorter cycle time. TENCOR Archer AIM+ utilizes advanced pattern recognition technology that takes into account variables such as blemish shape, size and spacing to characterize defects. It also uses physics-based simulators to accurately measure optical parameters that impact pattern inspection. Such parameters include resolution, focus and illumination. Further, the tool features advanced image filtering techniques for improved defect detection such as Gaussian filters, morphology filter and active contour algorithms. Archer AIM+ is optimized for high-volume production processes and offers integrated factory monitoring. This data can be customized and accessed remotely, providing superior process control over a wider range of defects. Furthermore, the asset utilizes advanced defect recognition algorithms to deliver accurate results while taking into account defects shifting over time. KLA / TENCOR Archer AIM+ is deployed in more than a hundred sites throughout the globe and is ideal for a wide range of mask Manufacturing processes and tests, including but not limited to EUV masks, optical photomasks, resist images and all double-patterning masks. Overall, KLA Archer AIM+ helps semiconductor manufacturers improve yield and reduce costs by delivering precise, detailed, high-throughput defect detection across a wide range of mask and wafer inspection needs.