Used KLA / TENCOR Archer AIM+ #78215 for sale

KLA / TENCOR Archer AIM+ is a mask and wafer inspection equipment specifically designed for advanced semiconductor production environments. It combines a variety of inspection methods, such as surface and cross section imaging, focus variation microscopy, and patterned wafer imaging, to ensure quick and accurate defect detection. The inspection system provides real-time, candid feedback on mask defects and design integrity, improving process decisions and reducing yield losses. Its advanced optics feature a large depth of field and full field of view, helping to identify even the most subtle defects. The unit also features advanced resolution capabilities including Airy phase contrast and near-field imaging. KLA Archer AIM+ uses proprietary software to provide a range of automatic mask defect detection capabilities, including auto-classification of defect types, auto-triage of defect lists, auto-focusing of defect images, auto-archival of defect images, auto-review of images, and a rule editor for custom mask flow. It can specify laboratory grade optics and configurable lighting on defective areas for accurate analysis. The machine also offers a suite of user-friendly inspection tools, including a multi-site inspection mode for viewing a wafer from multiple orientations, an alternate frequency scanning mode, advanced overlay accuracy and regression tools, and an adjustable edge-offset loup factor for precise defect analysis. TENCOR Archer AIM+ is a powerful tool for advanced semiconductor production, allowing for high-precision mask and wafer inspection in minutes. Its precise, highly-intelligent detection capabilities make it an invaluable addition to any semiconductor manufacturing operation.