Used KLA / TENCOR Archer AIM #9038074 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9038074
Overlay inspection system, 12"
Upgraded from a KLA Archer 10-02 Overlay system in Q3 2003:
a. Archer 10 upgrade to Archer AIM: Hardware upgrade to Archer 10XT and software upgrade to Archer AIM.
b. Archer Analyzer v 1.0 client (includes software disk and documentation).
c. Remote Archer Analyzer v 1.0 network client (includes software disk and documentation)
RFID reader and software upgrade in Q4 2005:
a. 0047590-000 E87 CARRIER MANAGEMENT SERVICE
b. 0047593-000 E40/E94 PROCESS JOB MANAGEMENT
c. 0043182-000 KIT,TDK CID,HERMOS ASCII RS232
300MM FOUP upgrade in Q4 2005:
a. (1) 0103388-000 Phoenix 300MM Dual FOUP
b. Preshipment Items:
i. (1) 0070136-000 Chuck assy
ii. (1) 0053800-002 3rcher Wait Station
iii. (1) 750-482031000 FFU High Top Sys.
iv. (1) 0031072-000 FFU Roof Wall Assy
Missing stage and isolation controller
2003 vintage.
KLA / TENCOR Archer AIM is a mask and wafer inspection equipment that enables high-precision automated defect detection and characterization. It offers superior image acquisition, remarkably fast throughput, and powerful imaging and analytics tools. KLA Archer AIM system is designed to address both traditional photo mask inspection, as well as customer specific applications such as die-to-die defect inspection and 3D defect recognition. The unit utilizes a high-speed line scan imaging architecture to acquire high-resolution images for defect detection and defect characterization. The imaging engine boasts a pixel size of 22nm providing true 450mm wafer coverage. This ability to handle even the largest wafers with precision allows TENCOR Archer AIM to identify defects with incredibly high accuracy. The machine comes equipped with powerful state-of-the-art Image Recognition Software for accurate and robust automatic defect detection and classification. This software offers superior single-stroke edge detection, pattern recognition, and false positive discrimination. The tool also incorporates sophisticated analytics engines for high throughput wafer inspection that can review everything from design layout to amorphous patterns. Archer AIM asset offers an unsurpassed combination of advanced imaging and automation tools that make it perfect for both traditional high-volume mask inspection, as well as advanced customer specific applications. It enables users to fast-track process development with automatic inspection and characterization of both normal and anomalous structures. Additionally, KLA advanced software tools provide complete mask inspection performance and functionality including access to comprehensive databases and review of patterns, wafer layout modifications, automated feature and pattern recognition, false positive reduction, and batch processing. The model also offers integration with advanced microscopy tools for even more detailed analysis capabilities. Overall, KLA / TENCOR Archer AIM equipment is a powerful and versatile mask and wafer inspection solution that offers dependable, accurate, and reliable results for both traditional mask inspection as well as advanced customer specific applications.
There are no reviews yet