Used KLA / TENCOR Archer AIM+ #9109277 for sale

KLA / TENCOR Archer AIM+ is an advanced mask and wafer inspection equipment designed for the modern semiconductor industry. This automated system provides inspection and review tools for critical photomask and reticle applications. KLA Archer AIM+ enables the detection of defects in both process development and production critical layers. TENCOR Archer AIM+ is designed to provide maximum inspection accuracy and cost savings. It employs multiple technologies, including microscope imaging, light scattering and polarized light imaging, in order to detect defects without the need for complex manual sample preparation. Archer AIM+ also uses proprietary algorithms and advanced pattern recognition to detect subtle geometrical and photomask defects. Its ability to detect and characterize defects on the fly further reduces preparation and inspection times. KLA / TENCOR Archer AIM+ also offers a comprehensive range of review capabilities. This includes pattern analysis and tracing, defect identification and review, plus tracking and analysis. The unit's advanced pattern library enables comparison to industry-standard patterns, as well as custom patterns defined by the user. KLA Archer AIM+ also offers multiple annotation and overlay options to assist with the review process. In addition to its robust defect detection and review capabilities, TENCOR Archer AIM+ also provides automated defect inspection, defect cluster detection and reporting. Its flexible, modular platform offers scalability for in-line as well as off-line integration, allowing for a variety of applications and processes. With an extensive range of software and hardware options, Archer AIM+ is suitable for a broad range of photomask and reticle inspection applications. KLA / TENCOR Archer AIM+ is an automated, cost-effective solution for detecting and reviewing photomask and reticle defects. The machine offers robust defect detection and review capabilities, along with automated defect inspection, cluster analysis and reporting. Comprehensive pattern libraries and annotation capabilities help users identify and characterize defects quickly and accurately. KLA Archer AIM+ also provides a scalable platform for process integration, making it an ideal choice for a variety of production environments.