Used KLA / TENCOR Archer AIM+ #9176822 for sale

ID: 9176822
Wafer Size: 12"
Vintage: 2011
Overlay inspection system, 12" Dual FOUP for DRAM and NAND Fully automated overlay measurement module: Coherence probe interference microscope Automated wafer handling Software: Windows XP based SW and user Interface Integrated user interface LCD Screen, 19" Floppy drive, 3.5" CD ROM Drive Tape drive back up system (DAT) Video hard copy printer Network ready: RJ45 (IOBase-T) BNC AUI Connector Tool options: Triple FOUP Electrical wiring Machine power cable: 15 Meters EMO Shield Archer 02S & 03 painted skins Light curtain with safety skirt double FOUP CMP Measurement (CPM+ANRA) Signal tower: (4) Lamps 40 mm GEM/SECS and HSMS E84 Enabled for OHT & AGV / RGV (2) PIO Devices for OHT: 3 PIO E87 (Based on E39) E40/E94/E90 (3) Thermos single wire CID, G4 RDM Machine client SW & license AA On-tool client CD & license Operation manual on CD 2011 vintage.
KLA / TENCOR Archer AIM+ is a mask and wafer inspection equipment designed to meet the most challenging requirements of the semiconductor industry. It provides unparalleled accuracy and repeatability in the inspection of even the most difficult photomask and reticle form factors. With its state-of-the-art technologies, such as computer-controlled optics, advanced pattern recognition algorithms, and a fully integrated software platform, it can reliably detect defects and anomalies in both metal and ceramic materials. KLA Archer AIM+ system employs an advanced optical unit to capture critical details of any mask or wafer. Its optical machine includes a wide selection of lenses, enabling fast and accurate recognition of defects and anomalies present on the substrate surface. The tool is especially capable of capturing smaller features, something most competing systems are unable to do. TENCOR Archer AIM+ asset also features a robotic handling model with automatic sample loading and unloading. This ensures repeatability in the sample loading process, and provides enhanced overall cycle time. Additionally, the equipment can accurately measure overlay placement and alignment, making it an ideal tool for assessing the mechanical integrity of the mask or wafer. In order to ensure an accurate inspection, Archer AIM+ system pairs its cutting-edge hardware with sophisticated pattern recognition and defect detection algorithms. The unit can recognize patterns and anomalies on the mask or wafer surface with a resolution up to 0.1 μm. It can effectively detect particles, pits, streaks, pinholes, and cracks - at any angle or position. The machine also offers a number of tools for improving analytical capabilities. These include image distortion correction, automatic defect classification, and a flexible metrics-based rules tool. Additionally, the asset is integrated with a software platform called Archer Insight , which enables users to easily manage their inspection data. KLA / TENCOR Archer AIM+ model is an ideal choice for semiconductor manufacturers who require dependable and highly robust mask and wafer inspection. Its advanced technologies and automated handling procedures ensure yield-critical inspections can be performed accurately and repeatably. Furthermore, Archer Insight provides users with an intuitive platform for managing, analyzing, and reporting inspection data.
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