Used KLA / TENCOR Archer AIM #9180730 for sale

KLA / TENCOR Archer AIM is a "mask and wafer inspection" equipment which is a tool used to detect and identify defects at the mask and wafer fabrication stages of semiconductor manufacturing. KLA Archer AIM system enables integrated circuit chip makers to increase defect detection & identify pattern defects faster and more accurately than ever before. It incorporates a new inspection technology — machine learning — to accurately identify the wide range of mask & wafer defects. TENCOR Archer AIM unit uses a combination of optics, image capture, and integrated software to detect and identify defects on wafer and mask patterns. Machine Learning is incorporated in the machine to enable faster and more accurate defect detection. It utilizes an advanced imaging and data acquisition technique called "breadth imaging", which uses a wide-angle lens and multiple exposures to create a single masking or wafer image. This enables the tool to compare a mask or wafer pattern to its corresponding visually inspected design in order to detect and classify defects. Archer AIM also employs a variety of advanced image processing techniques in order to detect and classify defects. The asset uses "Superpixel" technology to separate multiple defects located in close proximity to each other. It also utilizes "edge detection" to identify small differences between patterns which may indicate defective patterns due to misalignment or contamination. The model is further enhanced by the "sensitivity adjustment" feature, which allows users to adjust the equipment's defect detection threshold in order to maximize defect detection rates. The components of KLA / TENCOR Archer AIM system are integrated through a unified unit, which includes application software, network storage, a data acquisition/control station, and an image processor controller. The image processor controller is responsible for capturing, analyzing, and storing defect images, while the data acquisition/control station is used to control machine parameters such as mask and wafer positions, exposures, and exposures duration. KLA Archer AIM tool can be used for a variety of mask patterns and wafer types. It features a high-performance scan rate and is able to routinely scan large areas of a single mask or wafer pattern in a short amount of time. The asset is also able to capture thousands of images per hour, and generate defect reports or images quickly. TENCOR Archer AIM model provides consistent and reliable inspection results. With its high speed and superior defect detection capabilities, Archer AIM is a powerful tool for manufacturers to guarantee the integrity of their products while reducing their costs.