Used KLA / TENCOR Archer AIM+ #9226067 for sale

KLA / TENCOR Archer AIM+ is a mask and wafer inspection equipment designed for the cost-effective, accurate and automated inspection of reticles, display/projection masks, photomasks and wafers. It provides a comprehensive optical inspection capability that covers both inline and offline inspection of various masks, wafers and other vital substrate materials. KLA Archer AIM+ system is equipped with a proprietary LED and CCD based digital line scanning. Using this design, the unit is capable of automated imaging and analysis in both offline and inline configurations. The imaging and detection algorithms built into the machine provide users with a wide variety of analysis capabilities, including defect detection and classification for both opaque and transparent masks, surface analysis and area inspection of contact holes, as well as measurement and alignment of device parameters. The tool also allows for automated edge measuring of a wide range of reticles, including large area and dense contact holes. This feature allows for fast and reliable calibration and measure process, providing results in a fraction of the time normally required. TENCOR Archer AIM+ offers numerous options for defect classification, offering users different options depending on their individual needs and particular applications. This includes a 'Learn-it' method, which allows users to classify defects based upon high-resolution microscopy images into true defects versus process-induced effects. This method is particularly useful for advanced specialty photomasks with highly complex structures. In addition, the asset is capable of mask inspection with the highest resolution up to 100nm. This resolution provides an insightful analysis of the image features and form features, enabling detection of even the smallest defects. The model is also capable of creating a wide range of wafer level comparison plots for real-time process control and review. The Archer AIIM+ also comes with a range of additional features, including auto-focus optimized settings and a flexible image visualization to make it easier to identify defects. In addition, users can configure the software settings depending on their current needs and input settings. Moreover, the equipment is also available in a wide variety of configurations, ranging from single image masks to multi-site jobs and multiple process stages. Archer AIM+ is a modular system, which allows users to easily scale the unit up or down, according to their needs. It is also available in a range of power options, from 140-400 Watts, and is compatible with both PC and Mac platforms. In addition, the machine is also capable of supporting OCR-certified networking protocols and CAD-friendly data acquisition and transfer. Overall, KLA / TENCOR Archer AIM+ tool is a powerful mask and wafer inspection asset that comes equipped with a comprehensive set of tools for accurate and efficient imaging and analysis. It is an ideal choice for both production and research applications.