Used KLA / TENCOR Archer AIM #9231862 for sale
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ID: 9231862
Wafer Size: 12"
Vintage: 2003
Overlay inspection system, 12"
With ASYST IsoPort 9700-9129-01 Rev K load port
Dual load ports EFEM
With ASYST IsoPort
Signal light tower
BROOKS AUTOMATİON Handler with pre-aligner and robot
Robot controller
Handler
I/O Interface board
Motion controller
Optic
Z-Stage
Pneumatic box (Air and vacuum module)
Computer
Keyboard and mouse
Operator console
Monitor
Floppy Disk Drive (FDD)
CD ROM Drive
Tape drive
Printer
EMO
Shelf
Floatation damaged
Missing parts:
SBC Controller
Floatation controller
Hard Disk Drive (HDD)
Power supply:
230 VAC, 11.3 A, 50/60 Hz, Single phase
208 VAC, 12.5 A, 50/60 Hz, 2 Phase
2003 vintage.
KLA / TENCOR Archer AIM is an automated mask and wafer inspection system that captures high-resolution images of a substrate with up to 7μm pixel resolution and then analyzes them for defects. It is capable of performing fast and accurate inspections of high-value wafer and mask substrates, such as flash memory, LCDs and advanced feature sizes. The high-resolution images are analyzed and evaluated by a suite of software modules which compare patterns to identify fabrication and assembly defects. It includes tools like on-wafer defectivity analysis, critical dimension (CD) measurement and electrical test capability. It also offers non-destructive physical defect analysis, including film cracking and thermal stress analysis. The system can create inspection jobs for the user, with easy-to-use front-end software for application-specific job selection and manipulation. It has a powerful, custom designed user interface for executing mask and wafer inspection jobs for yield optimization. The system connects with a variety of robots for handling wafers or mask blanks from various vendors. The integrated defect review solution provides a secure review environment for doing detailed analysis work on the images collected by the inspection tool. It has class-leading image fidelity enabling quick defect-to-defect comparison of an entire wafer or mask blank. The review tool also includes sophisticated pattern recognition tools which aid in finding defect clusters. Overall, KLA Archer AIM provides a robust and reliable solution for mask & wafer inspection. Its sophisticated suite of software modules, combined with its high-resolution imaging capability, make it an ideal choice for advanced physical defect analysis, CD measurement and electrical test. Its integrated defect review solution also helps users to quickly and accurately pinpoint fabrication and assembly defects.
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