Used KLA / TENCOR Archer AIM+ #9236390 for sale

KLA / TENCOR Archer AIM+
ID: 9236390
Overlay inspection system.
KLA / TENCOR Archer AIM+ is an automated mask and wafer inspection equipment designed for the production of advanced integrated circuits. The system provides process-critical performance feedback to fabs and metrology laboratories for high-resolution measurements of composition, pattern and defect detection. The unit is equipped with a 2K high-resolution imaging machine complete with integrated software, advanced defect detection algorithms and on-board process control capabilities. The high-resolution imaging is capable of detecting, locating and measuring defects down to the sub-micron level. The integrated software suite includes precise measurements of patterned features, optical distortion, thin layer thickness, line resolution and surface reflectivity. KLA Archer AIM+ tool is built with a 3D tolerant inspection technology which allows it to detect subtle variation in a structure's geometry. The asset also offers advanced defect detection algorithms which are capable of detecting and classifying a wide variety of critical defects such as particles, tool marks, bridging and misalignment of overlay. The model is equipped with advanced software tools that enable the fabrication teams to analyze, modify, and review the data in real-time, as well as an in-line process control functionality which allows for the implementation of corrective actions that can reduce the defect rate. The equipment is designed with a robust user-centric platform that allows for customizing user-defined preferences for wafer inspection processes. This ensures faster and more efficient analysis by decreasing the time required to setup the tool for each data collecting task. The system is fully flexible and configurable, able to accommodate different types of structures, process recipes, and inspection environments. Finally, the unit can be easily upgraded and enhanced to maximize its performance and provide a shift to a more automated and efficientwafer inspection process. The upgradeable features provide a platform for production scalability and improved yield monitoring. The easy-to-use user interface provides a comprehensive set of measurements and enables users to quickly adjust tolerances and change protocols with the click of a button.
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