Used KLA / TENCOR Archer AIM+ #9237846 for sale
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ID: 9237846
Wafer Size: 12"
Vintage: 2005
Overlay inspection system, 12"
(2) ASYST IsoPort SMIF Systems
(2) Load ports
Handler system: Modular wafer handler, 12"
HLS Lamp
YASKAWA Robot
Options:
CMP Option (Low contrast target measurement)
Multi-layer XY separation
RDM V3XX Tool client license
Archer analyzer on-tool client license
Archer analyzer Pro-5 license
Tool internal camera for surveillance
Automation:
GEM/SECS and RS232
HSMS
E84 Enablement for OHT & AGV/RGV
E87 Carrier management services (Based on E39)
E40 Process job management
E94 Control job management
E90 Substrate tracking
(2) Advantage radio frequency (RF) carrier ID readers
Light tower
EMO Shield
Network interface: HSMS, GEM/SECS
SEMI Wafer standard with notched orientation
Cassette type: 25 Wafer FIMS-ENTEGRIS Spectra 26 slots
FOUP 25 Slots
Factory interface items, material interface, LP:
(2) FOUPs
Dual FIMS ENTEGRIS
Top shelter for subfab components
Side panels
Chemical filters for FFU: Air inlet of fan force
Options:
CMP Option (Low contrast target measurement)
Multi-layer XY separation
RDM V3XX Tool client license
Archer analyzer on-tool client license
Archer analyzer Pro-5 license
Tool internal camera for surveillance
UPS
Manuals included
Power supply: 230 V, 50 Hz, 15 A, Single phase
2005 vintage.
KLA / TENCOR Archer AIM+ is a mask and wafer inspection equipment that is designed to streamline the process of identifying, reviewing, and validating defect data in the semiconductor industry. The system is a comprehensive solution that utilizes powerful software and hardware from KLA. It uses a combination of inspection technologies, including high resolution wafer imaging, automated pattern recognition, and 3D defect analysis to provide rapid, precise, and repeatable results. The unit is comprised of a main unit and a microscope. The main unit houses the laser scanner, wafer handler, optical projector, image processing processor, and defect review machine. The microscope, which is connected to the main unit, is a high-resolution digital imaging tool that provides detailed images of features on the wafer surface at various magnifications. KLA Archer AIM+ utilizes a combination of defect review software and hardware peripherals to detect and analyze defects. Defects are acquired and processed in real-time, utilizing high resolution imaging and cutting-edge automated defect analysis technologies. Through a combination of pattern recognition and 3D analysis algorithms, the asset accurately identifies, counts, and classifies defect types on the wafer. The model includes an intuitive user interface to review and validate defects, as well as to customize the defect filter and set up automatic defect review. The equipment also includes a suite of pre-defined yield, fault, and reliability analysis tools to analyze the results for yield, defect levels, and other key metrics. These tools provide valuable insights into the manufacturing process, to help improve product quality and yield over time. TENCOR Archer AIM+ system is a powerful tool for improving overall product quality in the semiconductor industry. It provides quick, precise, and repeatable results, and offers a suite of tools to facilitate effective defect review and yield analysis. The unit is a highly automated and reliable solution for mask and wafer inspection, and can be easily integrated into existing SEMIConductor processes and systems.
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