Used KLA / TENCOR Archer AIM+ #9251129 for sale

KLA / TENCOR Archer AIM+ is a revolutionary mask and wafer inspection equipment designed to provide high-precision surface imaging and three-dimensional inspection for photomasks, reticles, and semiconductor wafers. The system utilizes a scanning electron microscope which offers better backscatter contrast, excellent low-kV imaging, dynamic focus control, and superior resolution. KLA Archer AIM+ is an automated unit that provides lightning-fast inspection times and tight process control—due to its unique design and use of advanced algorithms, the machine is capable of measuring and analyzing fast-moving defects with consistent accuracy. Using advanced automotive-grade framework and transistor-level defect measurement technology, TENCOR Archer AIM+ automatically maintains alignment accuracy of ±1 µm, both on optical and SEM systems, greatly simplifying the inspection process. The tool combines a 100 kV automated stored energy detector to accurately identify and measure electronic defects (EDCs) by recognizing the unique scattering and X-ray signals they generate. Its high-speed wafer mapping feature allows real-time monitoring of wafer yield, providing process engineers with a full picture of the wafer's condition and enabling them to respond directly to inconsistent yield issues. Archer AIM+ is an integrated and versatile mask and wafer inspection asset suitable for a variety of applications, ranging from front-end semiconductor device manufacturing to high-end optical devices. The model's powerful optics can inspect virtually any feature size (even those below the diffraction limit) and the large sample stage can easily accommodate many types of samples. The equipment also offers two-dimensional FEOL/BEOL coverage scanning, sufficient for die-level defect detection, and the system's sophisticated feature-based analysis capabilities allow users to accurately identify a wide range of defect types. Overall, KLA / TENCOR Archer AIM+ is a powerful, user-friendly and versatile imaging and inspection solution specifically designed to meet the needs of semiconductor, reticle, and photomask manufacturers. The unit's built-in automation and high-speed scanner make it easy to set up and operate, while the intuitive user interface ensures users can get the most out of the machine. The tool also provides detailed information on the quality of the samples and is capable of quickly identifying and measuring defects without slowing down the process. With its exceptional performance, accuracy, and intuitive operation, KLA Archer AIM+ is the perfect solution for mask and wafer inspection.