Used KLA / TENCOR Archer XT+ #293604014 for sale

KLA / TENCOR Archer XT+ is a mask and wafer inspection equipment for large area defect detection with automated throughput optimization. It is designed to perform on-product and post-etch sensitivity tests to enable production yield enhancement and end-of-line manufacturing test. The inspection system consists of a specialized optical/semiconductor defect detection unit. It features a 5-axis multi-dimensional scan head that enables high resolution imaging capabilities at high-speed frame rates. The machine also includes MultiSense2 Equalization Technology, helping reduce non-uniformity across the field of view. The tool is equipped with an advanced optical subsystem. It is capable of detecting minute defects such as particles and scratches at an impressive resolution of 0.040 microns, which helps to accurately identify particle defects. The asset offers advanced noise immunity for early and accurate identification of true defects. Additionally, the model also offers advanced false defect prevention capabilities through its advanced MultiSense2 Equalization Technology. KLA Archer XT+ is designed to rapidly process even the most complex mask and wafer structures with its multi-dimensional scan head aided by its proprietary Equalization Technology. It is capable of inspecting large areas quickly and accurately, even on challenging substrates such as with tightly spaced patterns. With the equipment's high speed, high resolution and automated throughput optimization, TENCOR Archer XT+ offers the ultimate in on-product and post-etch defect detection capabilities. The system is compatible with a wide range of metrology and defect characterization tools, and supports automated throughput tracking and optimization. In addition, KLA offers a suite of integrated software packages to increase efficiency. This includes advanced process control and pattern matching algorithms, offering complete control and optimization of the inspecting unit. In conclusion, Archer XT+ is a powerful and versatile mask and wafer inspection machine. It offers advanced optical subsystem capabilities, along with MultiSense2 Equalization Technology, to provide ultimate sensitivity and accuracy in defect detection. The tool also supports advanced software control and automation capabilities to ensure maximum throughput.