Used KLA / TENCOR Archer XT #9034312 for sale

KLA / TENCOR Archer XT is an advanced mask and wafer inspection equipment designed for use in a wide variety of semiconductor manufacturing applications. The system features high-speed, high-precision, 3D inspection of masks and wafers; and provides in-depth analysis and characterization tools, designed for the most critical mask and wafer defect inspection requirements. KLA Archer XT is based upon KLA advanced optical, software, and imaging technologies, and provides a wide range of automated functions, such as defect detection, defect classification, and image analysis. Allowing for quicker defect detection and identification, the unit speeds up the process of detecting, locating, and characterizing defects on wafers and masks, without sacrificing accuracy. TENCOR Archer XT provides four imaging systems - bright field, low angle bright field, dark field, and fluorescence - which help to support a wide range of defect types. It also provides advanced algorithms and post-processing functions, like pattern-based grouping, defect classification, and advanced analytics, further aiding the classification of defects. Archer XT machine is highly customizable and can be configured to meet specific needs. To further support its advanced defect inspection capabilities, the tool uses a multi-configurable wafer holder, providing best-in-class defect inspection capability. It also features a modular design allowing for expandability, and easy maintenance and upgrade. The asset features a Small Field of View (SFOV) capability, which enables less than 100nm design rules to be viewed and inspected. The SFOV technology creates an environment of increased screening accuracy and sharpness, allowing for greater defect detection capabilities. KLA / TENCOR Archer XT is designed for ease of use, providing comprehensive tools for the development, analysis, and evaluation of yield management and process control. The model can be integrated with TENCOR inspection and yield management systems, enabling additional automation and data integration capabilities. With its advanced detection capabilities and easy-to-use interface, KLA Archer XT equipment provides a complete mask and wafer inspection solution. The system delivers three dimensional inspections of masks and wafers, in-depth analysis and characterization of defects, SFOV capabilities, and automated data collection and analysis. Supporting the most stringent of semiconductor manufacturing requirements, TENCOR Archer XT is the ideal choice for any organization looking to maximize its mask and wafer yield.