Used KLA / TENCOR Archer XT+ #9221909 for sale

KLA / TENCOR Archer XT+ is a fully integrated mask and wafer inspection equipment for advanced process node technologies. KLA Archer XT+ integrates advanced scanning electron microscopy (SEM) technology and a high-sensitivity contact imaging technology into one integrated package. It enables high-resolution, 3D multi-layer patterning visualization and measurements with 10x or greater resolution. TENCOR Archer XT+ system features a high-performance, optical microscopy-based alignment unit that achieves nanometer-level patterning accuracy. The alignment machine is designed to reduce inspection time, improve data accuracy, and increase yield of complex processes such as EUV, double- or triple-patterning, copper deposition. The tool also features a multi-layer imaging asset that enables high-resolution 3D patterning visualization. The multi-layer imaging model uses a combination of SEM and elemental analysis to generate high-resolution 3D images of the patterned layers. Archer XT+ equipment also integrates a high-sensitivity contact imaging technology for defect detection and pattern recognition. This technology provides highly-sensitive detection and characterization of defects, even in very small, dense structures. It also enables both feature-level defect analysis and comprehensive defect classification. In addition, KLA / TENCOR Archer XT+ system provides advanced defect classification and data analysis tools. These tools enable the user to quickly analyze defect data, classify defects, and identify root causes. The unit also integrates with a number of third-party automation chips for improved throughput. KLA Archer XT+ provides a comprehensive solution for mask and wafer inspection. Its advanced scanning electron microscopy, high-resolution imaging, defect detection and data analysis tools provide a powerful, high-performance solution for advanced process nodes. It is well-suited for both foundries and fabless customers seeking to improve yield and reduce costs.