Used KLA / TENCOR Archer XT+ #9227344 for sale

KLA / TENCOR Archer XT+ is a mask and wafer inspection equipment designed for advanced semiconductor lithography and die manufacturing processes. It provides automated analysis of raw images from electron microscopy (SEM), electron beam lithography (EBL), scanning electron microscopy (SEM) and e-beam direct write (EDW) data. The system enables high-speed, high-resolution inspection of particle residues from wafers, masks, and e-beams with the ability to detect individual defects down to the nanometer. KLA Archer XT+ employs proprietary algorithms to rapidly analyze millions of pixels for analysis for precise mask and wafer defect detection and classification. This unit is able to detect a wide variety of defects, including gross defects such as Opens, Shorts, and repeated defects; edge or pattern placement accuracy (Euler) defects; layer-to-layer misregistration; grain orientation detections; resist coverage; grain structure; and surface roughness. It also incorporates rigorous mechanisms of measurement and reporting accuracy ranging from <1µm to 1nm depending on the defect type. TENCOR Archer XT+ is built with a fully automated inspection and metrology suite. This includes an efficient imaging, filtering and segmentation toolset, integrated with clever analytics to detect, classify, and validate defects. An included library of comparison algorithms allows for rapid analysis of historical data. Additionally, the machine uses advanced predictive analysis to recognize and alert users to potential process and process-tooling problems. In addition to automated inspection and analysis, Archer XT+ provides access to a wide range of visualization tools. This includes multi-image alignment for composite defect analysis, multivariate analysis for complex defect analysis, and the ability to detect and compare features to specification. The provided Wafer and Mask Strip Analysis capabilities enable instant, multi-image navigation and advanced image analysis routines. KLA / TENCOR Archer XT+ is an optimal metrology solution for mask, wafer, and die production. Its advanced results accuracy, powerful algorithms, automated defect detection and classification, and visualization capabilities make it an ideal tool for process optimization and advanced defect management.