Used KLA / TENCOR Archer XT+ #9231431 for sale

KLA / TENCOR Archer XT+ mask and wafer inspection equipment is a comprehensive web control system for the inspection of complex mask and wafer patterns. The unit utilizes a variety of advanced technologies to detect and correct complex defects at the nanometer level, ensuring the highest level of process accuracy and yield. The XT+ machine includes advanced Defect Detection & Classification (DD&C) technology which combines a variety of optical techniques and sophisticated image processing techniques to detect and locate sub-micron defects in mask and wafer patterns. DD&C uses algorithms that analyze a variety of options including aerial images, scatterometry, photomask images, focus sequences, active phase contrast, faint scatterometry, and dark field imaging. The tool can detect small feature sizes, as well as identify critical defects such as structural defects, photomask defects, and trapped charges. The XT+ asset is also equipped with a litho-metrology platform which enables sub-micron inspection of dimensional long and short pitch features. This provides a critical reduction in defect density, resulting in improved process control and improved productivity. The XT+ includes film-stress metrology, allowing users to measure the linearity of features, enabling more accurate process modeling and better sourcing of high-quality materials. The model is also equipped with automated Critical Dimension (CD) metrology, which provides precise measurement of process variations across the entire wafer. The XT+ equipment is capable of automated tracing and defect location, using advanced pattern recognition techniques. It is also equipped with a high-speed intelligent defect registration system for rapid defect classification and verification. The XT+ also offers several web control safety features including a screen lock timer, access control, and data encryption. KLA Archer XT+ mask and wafer inspection unit is a comprehensive machine for the inspection of complex mask and wafer patterns. Its combination of advanced DD&C technologies, litho-metrology platform, film-stress metrology, and automated CD metrology provides the highest level of accuracy and yield. Automated defect tracing, defect location, and intelligent defect registration ensure rapid defect classification and verification. Furthermore, the XT+ tool comes with several web control safety features for enhanced security. This makes TENCOR Archer XT+ mask and wafer inspection asset an excellent choice for the inspection of complex wafers and masks.