Used KLA / TENCOR Archer XT #9241251 for sale

KLA / TENCOR Archer XT
ID: 9241251
Wafer Size: 8"
Vintage: 2005
Overlay measurement system, 8" 2005 vintage.
KLA / TENCOR Archer XT is a mask and wafer inspection equipment designed to provide high-speed, high-precision characterization of semiconductor ICs. Utilizing advanced optics and imaging technologies, KLA Archer XT can identify features and defects on the wafer surface in high resolution, even at very small scales. For imaging, TENCOR Archer XT is equipped with dual 10-MPixel cameras and a high-end light source. The cameras take images of the wafer surface and are combined with other signals to produce detailed images that allow for accurate and rapid characterization of defects. The light source provides optimal levels of contrast and brightness that is necessary for thorough inspection of the device. Archer XT is also equipped with a pattern recognition system that can accurately detect even the smallest of defects on the surface of the wafer. By combining sophisticated algorithms with adaptive optics, this unit is able to detect even the smallest of defects that would otherwise be difficult to see. KLA / TENCOR Archer XT features a user-friendly GUI for ease of operation. It also offers a variety of powerful analysis tools to help with the characterization of defects. This includes the ability to analyze multiple images and compare them to a reference image, overlay individual images to quickly identify potential defects, and export and analyze data in a variety of formats. In addition to its mask and wafer inspection capabilities, KLA Archer XT is also capable of measuring process parameters such as overlay accuracy, line widths, and critical design dimensions, providing users with detailed information about their designs. The machine can also measure defects in situation-specific modes, allowing users to quickly isolate problems and investigate further. Overall, TENCOR Archer XT is a powerful, user-friendly mask and wafer inspection tool that can quickly identify and isolate defects in a variety of formats and surfaces. Equipped with advanced optics, imaging technologies, and sophisticated analysis tools, it is ideally suited for IC characterization and design verification.
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