Used KLA / TENCOR Archer XT+ #9256573 for sale

KLA / TENCOR Archer XT+ is a mask and wafer inspection equipment designed for the most demanding process control applications in the semiconductor industry. The system employs advanced automated metrology techniques and advanced software to provide rapid, localized measurements of both production and research wafers. KLA Archer XT+ unit uses a unique dual-beam imaging machine to deliver high-resolution images of semiconductor features, including gate layers, polysilicon patterns, and diffusion lines. The tool offers automated metrology capability at multiple levels of resolution, from visual overviews to nanometer-scale feature characterization. This allows for the accurate determination of feature parameters, including line width, overlay alignment, critical dimensions (CD), and process variations. Through the use of the optional integrated secondary electron imaging asset (SEI), TENCOR Archer XT+ users can also examine the surface properties of wafers. Archer XT+ model also provides an in-line imaging capability, with optional systems for digital image correlation (DIC) and maskless imaging. This enables the equipment to rapidly analyze mask patterns and generate detailed images for defect inspections. With the addition of an AreaGap System, KLA / TENCOR Archer XT+ can be configured for mapping and characterization of three-dimensional (3D) patterns. The unit is also equipped with advanced software applications for data analysis, defect detection, and process control. Built-in productivity tools allow users to generate comprehensive reports on defect categories, photomask variance, and other key metrics for process control. These applications, combined with KLA Archer XT+'s high-resolution metrology capabilities, provide users with high accuracy, fast turnaround times, and improved process control.