Used KLA / TENCOR Archer XT+ #9272511 for sale

KLA / TENCOR Archer XT+ is an advanced mask and wafer inspection equipment that enables both very high-resolution 2D and 3D inspect scans of challenges such as dense patterns, high aspect ratio contact holes, low contrast features, derivatives, etc. The system ensures faster cycle time, higher defect detection rates, better defect classification accuracy, and improved results with experience-based corrections. Powered by advanced Computational Imaging (CI) technology, KLA Archer XT+ provides semiconductor manufacturers with a special look at complex patterns to be able to identify defects quickly and accurately. It features a field emission electron beam source that scans and inspects wafers and masks with a range of up to 25000X in a single scan. The unit is aided by a state-of-the-art automated electromagnetic machine for improved accuracy, repeatability, and traceability. Additionally, there are a range of inspection capabilities for high-resolution masks and reticles such as overlay inspection, Contrast Interest (CI) inspection, and design-for-inspection (DFI) capabilities that are designed to detect every micro-level defect in the pattern. Apart from that, TENCOR Archer XT+ is loaded with other features such as: Automated operational features which ensure efficient operations. Advanced defects identification capabilities that are tailored to meet the requirements of the most challenging structures. Comprehensive defect classifications which provide necessary details concerning the types of defects found. A powerful Image Data Acquisition (IDA) software that guides and verifies the results of the inspection process. Upgradable features and software packages that help users keep up with very newest technologies. All these features empower users to maximize throughput by spotting potential design issues early, precisely prioritize defects, and maintain yield with a range of post-scan 3D effects. These make Archer XT+ a reliable and comprehensive tool for manufacturing precision masks, wafers, and devices.