Used KLA / TENCOR Archer #9152895 for sale

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ID: 9152895
Dual FOUP handler Pre aligner.
KLA / TENCOR Archer is an automated mask and wafer inspection equipment designed to detect defects at the nanometer level. It consists of a subscan path unit (SPU), an imaging system, and a computer-aided design (CAD) unit. The SPU consists of two motorized tables that move in the X and Y directions, allowing for the scanning of a sample in the X, Y, and θ (tilt) axes. The secondary and primary scanners are the components used to acquire images of the samples. The secondary scanner has a CCD camera that acquires a digital image of the sample, and a laser diode that measures the step height of the sample. The primary scanner mounted on the SPU includes both a CCD camera and a laser diode, which is used for focusing and for high-resolution imaging. The CAD machine is used for storing and organizing the data and for creating a mask or a layout of the pattern to be inspected. KLA Archer inspects defects through a variety of techniques including bright and dark field imaging, phase contrast imaging, and image subtraction. Bright field imaging uses high intensity light to detect the presence of defects by the intensity of the reflected light. Dark field imaging uses lower intensity light as a reference and detects defects by the variation in the intensity of the reflected light. Phase contrast imaging is used to detect the interface between oxide and silicon wafers. Image subtraction is used to subtract the surface image from a reference image to detect changes in the surface features. The tool also features an advanced image processing function that identifies potential anomalies and detects anomalies with high accuracy. Additionally, TENCOR Archer can be integrated into existing process flow to enhance existing material analysis, fault diagnosis, control and yield management. Through its dual-resolution technology, the asset can detect and correct defects on small areas, like contact holes. Finally, the model automatically records measurements and can store data in standard formats. This data is used for analyzing trends, generating reports, and enhancing data collection. Overall, Archer is an automated, high-speed, high-resolution mask and wafer inspection equipment. By providing defect detection at nanometer level, this system is suitable for defect detection in a variety of industries, including semiconductor, flat panel display, and disk drive manufacturing.
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