Used KLA / TENCOR AWUS 3110 #293809499 for sale

KLA / TENCOR AWUS 3110 mask & wafer inspection (MWI) equipment is a state of art, computer-controlled inspection system designed to inspect photomasks and wafers for defects. It combines industry-leading optical and image-processing technologies to provide operators with a comprehensive platform for identifying and characterizing defects on integrated circuit (IC) mask and wafer layers. The unit is equipped with a general-purpose optical microscope, an X-Y stage, and a 248 nm digital light processor (DLP). This allows the user to image, analyze, and measure the integrity of both semiconductor mask and wafer surfaces. By optimizing the response of the DLP to various illumination levels, KLA AWUS 3110 delivers sophisticated, high-speed inspection capabilities. TENCOR AWUS 3110 utilizes a backside-illumination technique, where the light source is placed beneath the sample rather than above. This method allows for a much lighter and lower-power machine, making AWUS 3110 an ideal tool for inspecting large samples of mask or wafer layers. The tool also employs a dual-side optical asset that allows for rapid scanning of both sides of a sample, allowing for a faster turnaround time and more accurate results. The model utilizes an independent software platform that is designed to analyze and process data efficiently. This platform can be set to automatically detect and define the characteristics of any number of prospective defects. In addition, the platform allows the user to customize automated detections and set up manual testing operations. In conclusion, KLA / TENCOR AWUS 3110 mask & wafer inspection equipment is a high-performance, low-cost system that provides customers with a comprehensive platform for both assessing and correcting defects in mask and wafer layers. It utilizes modern optical and image processing technologies, and provides users the flexibility to customize automated inspections for a variety of applications.