Used KLA / TENCOR Candela CS20 #293597265 for sale

KLA / TENCOR Candela CS20 is a world-leading and highly versatile mask and wafer inspection equipment designed to meet the demanding and ever-changing needs of today's high-tech semiconductor industry. The system offers unparalleled capabilities to detect, characterize and analyze defect signals and feature parameters with unsurpassed accuracy. KLA CANDELA CS-20 is capable of inspecting both reticles and wafers, and provides unparalleled defect sensitivity, wafer-level and feature-level characteristics, and unmatched defect classification capabilities. It features an innovative imaging architecture that employs 7K x 4K variable resolution CCD cameras. This powerful combination of resolution, read-out rate, and variable field of view enables the simultaneous inspection of reticles and wafers. The unit's powerful image acquisition algorithms enable rapid and accurate characterization of both positive and negative features. TENCOR CANDELA CS 20 offers a wide range of contrast enhancement methods, including post processing, contrast correction, resolution enhancement, and optical enhancement. This ensures accurate measurements in the presence of different types of background patterns, layers, and noise. In terms of metrology, the machine offers a wide range of tools to analyze size and shape parameters, from basic pattern recognition to complex feature measurements. It also provides powerful defect classification capabilities based on neural networks and fuzzy logic. This enables users to identify potential defect types, as well as select the most suitable defects for different processes. TENCOR Candela CS20 also includes automated wafer management, image analytics, and other advanced engineering analytics tools to enable fully automated and robotic inspection processes. The tool is controlled via a dedicated Web-based user interface, allowing users to access and analyze the data collected from their mask and wafer inspection processes. Overall, CANDELA CS-20 is an innovative and highly versatile mask and wafer inspection asset that provides a comprehensive set of features and capabilities to meet the demanding needs of modern semiconductor fabrication