Used KLA / TENCOR Candela CS20 #293607165 for sale

KLA / TENCOR Candela CS20 is a leading-edge mask & wafer inspection equipment that is capable of inspecting up to 200mm semiconductor wafers. This system utilizes the HDR-3000 hybrid pattern recognition technology for automated defect and mask registration, providing superior sensitivity and accuracy. The advanced optical design of the unit includes six UV and visible channels, allowing for the inspection of several types of features on the mask or wafer, such as full-field of view, line-edge and grating objects. Additionally, KLA CANDELA CS-20 is designed to support a range of material inspections, including reticles and photomasks, with ultra-high throughput capabilities and a product lifetime of less than 10 years. The machine is equipped with state-of-the-art illumination systems and hardware components, including brightfield, oblique angle darkfield, bright darkfield, polarized darkfield, and oblique angle brightfield. The advanced optics tool is equipped with four On-The-Fly (OTF) cameras, capable of magnifying features up to 1000x, allowing for the detection of even the smallest defects on a wafer or mask. TENCOR CANDELA CS 20 is further equipped with an automated defect review (ADR) asset, which is capable of identifying print rejects and X/Y translation errors for pattern placement, as well as providing automated reticle to wafer inspection. Additionally, it is equipped with image analysis software, including Auto-Align, to ensure alignment accuracy and Imcover to provide coverage maps of metallic and nonmetallic feature defects. The CS20 is ideal for wafer and mask inspection and has the potential to reduce total defect levels by up to 40%. It quickly identifies, classifies, and maps defects, enabling faster resolution and reducing false alarms. Furthermore, the model is highly reliable, with high throughput yields and defect counts that are comparable to the best industry competitors. In addition to its excellent performance, KLA CANDELA CS 20 is designed to be user-friendly, with an intuitive graphical user interface, providing users with an easier way to inspect, analyze, and repair the defects on a wafer or mask. Overall, KLA / TENCOR CANDELA CS-20 is a high-performing and reliable equipment for mask and wafer inspection. Its advanced optical design and automated systems provide accurate and high-sensitivity inspection, enabling timely repair of defects for highest yield and production throughput. The user-friendly interface also makes it easy to use, helping to reduce cost and time for even the most complex inspection tasks.