Used KLA / TENCOR Candela CS20 #293772319 for sale

ID: 293772319
Wafer Size: 6"
Vintage: 2006
Surface measurement system, 6" Illumination source: 8mW Operator interface: Tracball and keyboard standard Substrate thickness: 350 µm-1100 µm Substrate material: Any clear / Opaque polished surface Defect sensitivity: 0.08 µm Scratches: 100 µm Stain: 20 µm Opaque substrates EPI Layer Transparent film coatings: SIC, GaN, Sapphire Parameters: Ra / Rq / Wa / Wq Cassette handling: Single puck with up to 200m Operating environment specifications: Voltage supply: < ±10% Environment: Class 1000 / Better recommended Air: CDA 95-110 psi, 2 CFM Equipment: Pollution degree 2 Power supply: 8A Computing system: Hard drive: 200 gb RAM: 2 gb Ethernet: Network card Operating system: Microsoft windows XP 2006 vintage.
KLA / TENCOR Candela CS20 is a cutting-edge mask and wafer inspection equipment that is an essential tool in the semiconductor manufacturing process. This system is designed to provide high-resolution imaging and analysis capabilities for detecting defects and ensuring the quality of masks and wafers used in the production of integrated circuits. At the heart of KLA CANDELA CS-20 is its advanced optical technology, which enables the unit to capture extremely detailed images of masks and wafers with exceptional clarity and precision. The machine utilizes a combination of brightfield and darkfield illumination techniques to reveal defects and other imperfections that may be present on the surfaces of these critical components. The high-resolution imaging capabilities of TENCOR CANDELA CS 20 allow for the detection of defects as small as a few nanometers in size, ensuring that even the most minute flaws are identified and addressed during the manufacturing process. One of the key features of Candela CS20 is its ability to perform rapid and automated inspections of masks and wafers, allowing for high-throughput analysis of large numbers of components in a short amount of time. The tool is equipped with advanced image processing algorithms that can quickly and accurately identify defects and anomalies, helping manufacturers to maintain high levels of quality control and ensure the reliability and consistency of their products. In addition to its imaging capabilities, CANDELA CS 20 also offers a range of analytical tools and functionalities that enable users to perform detailed analyses of defects and other features on masks and wafers. The asset can generate 3D representations of surfaces, allowing for in-depth characterization of defects and providing valuable insights into their morphology and distribution. Users can also perform statistical analyses of defect data, helping to identify trends and patterns that may indicate underlying issues in the manufacturing process. TENCOR Candela CS20 is designed to be user-friendly and easy to operate, with a intuitive interface that allows users to quickly set up and execute inspections. The model can be configured to perform a wide range of inspection tasks, from routine quality control checks to more in-depth analyses of specific features or defects. Users can customize inspection parameters and criteria to suit their specific requirements, ensuring that the equipment meets the unique needs of their manufacturing operation. Overall, CANDELA CS-20 is a state-of-the-art mask and wafer inspection system that offers unparalleled imaging and analysis capabilities for semiconductor manufacturers. With its advanced optical technology, high-resolution imaging capabilities, and sophisticated analytical tools, KLA / TENCOR CANDELA CS-20 provides a powerful solution for detecting defects and ensuring the quality and reliability of masks and wafers used in the production of integrated circuits.
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