Used KLA / TENCOR Candela CS20 #9150360 for sale

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ID: 9150360
Vintage: 2010
Optical surface analyzer Standard capability 2010 vintage.
KLA / TENCOR Candela CS20 is a high-performance mask and wafer inspection equipment designed for precise and reliable detection of defects in mask production. The system is equipped with multiple, advanced features to provide unparalleled inspection accuracy in the most challenging wafer and mask production environment. The unit utilizes its advanced optics to provide impressive image resolution up to 10nm and a wide array of options for image processing including image restoration, edge enhancement, contrast adjustment, and colorization functions. It is also capable of detecting defects with a minimum contrast of 8:1. Additionally, KLA CANDELA CS-20 utilizes advanced proprietary algorithms to distinguish true defects from false signals. TENCOR CANDELA CS 20 has a wide range of automated features and tools to help customers reduce the time spent on each inspection. The machine includes several automatic wafer edge mapping options, allowing for the accurate determination of wafer center location so that alignment problems can be avoided. Additionally, the tool features automatic defect identification and defect classification. These tools enhance the asset's sensitivity for discovering smaller, hard-to-detect defects. Operationally, the At Candela CS20 is equipped with a user-friendly, Windows-based graphical user interface that simplifies model manipulations. This makes it easy to set up job specific inspections, program automated processes, and remotely monitor the entire equipment. The system also supports remote service and repair when necessary. TENCOR Candela CS20 mask inspection unit offers superior performance and advanced features that make it one of the best on the market for detecting small defects and small defects in wafer and mask production. This machine has set a new standard in wafer and mask inspection, providing customers with fast, reliable, and accurate results.
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