Used KLA / TENCOR Candela CS20R #293609511 for sale

KLA / TENCOR Candela CS20R is a mask and wafer inspection system that operates in a vacuum environment and is used for the automated characterization and defect analysis of wafers and masks. The CS20R features a 300mm stage that enables high-accuracy sample alignment, patterning, and measurement of both top-view and cross-sectional images. Its integrated filters enhance the imaging fidelity and enable lateral imaging over a wide wavelength range. The CS20R utilizes both brightfield and darkfield imaging techniques to capture the full omni-directional reflectivity of the mask or wafer surface. Data is acquired via Fluorescence Correlation Spectroscopy (FCS) to detect any potential defects, such as scratches and etched patterns, on the mask or wafer. The system's multi-beam LensEngine acquires data from both the top- and bottom-view images. It has been optimized for contrast, tonality, and pattern recognition over a wide field of view. The CS20R is also equipped with advanced data acquisition and analysis software. It is capable of analyzing large amounts of data in a short amount of time, with minimal user intervention. Statistics generated by the analysis can then be used to make decisions and provide feedback on the results. The CS20R is designed to be housed in a hermetically sealed enclosure. This helps to improve the environmental control and minimize interference from dust, dirt, and other elements that can affect the accuracy of the data gathered. The CS20R was designed to be both reliable and efficient. It can quickly detect any defects or irregularities on the masks and wafers, and provides users with the data needed to make accurate decisions. With its advanced imaging technology and software capabilities, KLA CANDELA CS 20R is a reliable and cost-effective mask & wafer inspection system.