Used KLA / TENCOR Candela CS20R #9276235 for sale

KLA / TENCOR Candela CS20R is a cutting-edge mask and wafer inspection equipment designed for critical thin-film and structure metrology applications. Its powered by KLA signature Nanometer Focused Ion Beam (NFIB) technology which allows it to provide rapid, repeatable, and accurate measurements in the sub-10nm regime. This makes the system ideal for quality control and quality assurance purposes, especially for showcasing semiconductor, optical, and display components. The CS20R has a fully automated design which makes it efficient and user-friendly even for those who are new to metrology. It has a large dual-wide sample chamber that can fit devices up to 12" in diameter and can control up to 2 stages simultaneously for faster inspection. It has a Field of View (FOV) of up to 80mm which is ideal for full 360° inspection, plus a patented line scan capability that allows for up to 1000x magnification and dynamic full-field image stitching. KLA CANDELA CS 20R is equipped with patented AutoDefect Inspection (ADI) software that enables the unit to detect defects from a variety of sources, including defects such as stains, pinholes, slips, and anomalies. The software also has automated sampling capabilities, so the machine can sample and inspect the entire device without any manual intervention. On the reporting side, TENCOR CANDELA CS-20 R can automatically generate detailed reports that contain all the critical data points, including measurement results, device type, size, and condition. This helps to quickly identify defects without needing to review the same data multiple times. The tool also has built-in quality assurance capabilities, so sample acceptance is fast and efficient. In summary, KLA Candela CS20R is a comprehensive mask and wafer inspection asset designed for high-precision metrology applications. It features a robust design, an intuitive user interface, and powerful NFIB technology that enables rapid, repeatable, and accurate measurements down to the nanometer level. It is ideal for use in semiconductor, optical, and display applications and is equipped with advanced defect detection software and quality assurance features.