Used KLA / TENCOR Candela CS20V #9412205 for sale

KLA / TENCOR Candela CS20V is a high-precision mask and wafer inspection equipment designed for semiconductor processing. The system provides advanced optical metrology capabilities and utilizes high accuracy imaging sensors to identify defects and imperfections in patterns on the masks and wafers. The unit also provides a comprehensive software suite for data analysis and defect characterization. The machine uses two imaging techniques to detect defects in masks and wafers, including chromaticity imaging and wide-angle imaging. Chromaticity imaging is used to detect differences in color between defects and the surrounding area, while wide-angle imaging can detect defects of a variety of sizes, shapes and depths. The tool also includes an off-axis imaging mechanic that uses an incoherent light source to more precisely identify small and difficult to detect defects. KLA CANDELA CS 20 V also features state-of-the-art optical metrology capabilities which enable the user to measure critical features, including critical structural features and contact hole sizes on wafers. The asset combines intricate algorithms with advanced optics, which provide ultra-precise measurements of topics such as depth, width, and height on a microscopic level. The model includes proprietary image and signal processing software which automates defect detection, enabling the user to trace faint patterns in the signal and identify minute defects. It also includes automated characterization software which further simplifies the process of characterization and inspection of defects. The software is easy to use and integrates seamlessly with KLA other products. TENCOR CANDELA CS 20-V is an advanced inspection equipment featuring advanced optical metrology capabilities, high-precision imaging sensors, and a powerful software suite for data analysis and defect characterization. It is suitable for use in semiconductor processing, as well as other inspection applications, and provides a reliable, accurate and user-friendly solution for detecting defects in masks and wafers.