Used KLA / TENCOR CRS 1010 #51182 for sale

KLA / TENCOR CRS 1010 is a mask and wafer inspection equipment used in semiconductor fabrication to identify potential metrology errors and optical defects in photomask and wafer substrates. The system uses a high-resolution brightfield/darkfield imaging unit with advanced optics and high-definition digital processing capabilities to examine each mask/wafer for defects. KLA CRS 1010 is capable of inspecting up to twenty-four mask plates or wafers simultaneously, providing faster throughput and higher throughput yields with high accuracy and repeatability. The machine's imaging tool consists of two detectors, a brightfield and darkfield detector. The brightfield detector is designed to identify particle defects, while the darkfield detector is utilized to detect optical defects. The imaging asset operates at various magnifications, enabling users to inspect features down to 0.2µm and smaller. The model's automated defects classification algorith recognizes and classifies particles, nanostructures and dislocations, with defect auto-focusing and precise measurement of each defect. TENCOR CRS 1010 is equipped with various advanced features to enhance inspection capability and drive better process control. It features advanced filter selections, enabling precise identification of defects. Users can customize filter settings per application and can specify their own color parameters for precise defect identification. The software also enables users to define their own thresholds and customize defect sorting. Furthermore, the equipment includes batch inspection, allowing users to inspect multiple substrates concurrently. CRS 1010 system is designed for reliability and ease of use in mind. It utilizes a secure, closed-loop robotic workload handling and substrate centering, ensuring precise mask/wafer positioning and reducing risk of sample damage. Furthermore, the unit contains an air-stage for sample transport, providing a clean, dust-free environment for inspection. With its intuitive user interface, users can quickly and easily program the machine, enabling fast and accurate setup, execution, and analysis. In conclusion, KLA / TENCOR CRS 1010 is an advanced inspection tool designed for accurate and precise mask and wafer inspection. Its high-resolution imaging and automated defect classification capabilities enable users to quickly and easily identify defects on mask and substrate surfaces. Its intuitive user interface, fast throughput, and reliable performance make it an ideal mask/wafer inspection asset, ensuring higher yields and better process control.