Used KLA / TENCOR CRS 1010 #9139572 for sale

KLA / TENCOR CRS 1010 Mask & Wafer Inspection Equipment is a comprehensive wafer and mask inspection platform designed to inspect a wide range of semiconductor devices. It features the latest in imaging and inspection technology, ensuring the highest level of quality in the manufacturing process. The system is composed of dual CMOS imaging arrays with both 4K and automated stitching, a built-in advanced defect engine, and a powerful image stitching engine. The imaging arrays, designed with the latest IC technology, provide a cost-effective and reliable way to perform image inspection. The dual imaging array features two imaging sensors with 4K resolution and constant FOV adjustment, enabling high-resolution inspection at a wide variety of NAND, SRAM, and DRAM processes and photomasks. Furthermore, the unit provides a fully automated stitching capability, providing users with the ability to stitch multiple 4K frames together to produce high-magnification images for accurate defect analysis. The advanced defect engine is capable of detecting a wide range of defects, including dark spots, edge defects, point defects, and block defects. All relevant defects are logged and rendered/organized in images, allowing users to quickly locate, identify, and analyze the exact nature of the defect. This helps users to quickly isolate and mitigate process-related defects. Additionally, the machine has a powerful image stitching engine, allowing users to create high-resolution images with up to 500,000 addressable points. KLA CRS 1010 Mask & Wafer Inspection Tool showcases several features that benefit users in the semiconductor industry, such as improved yield performance, shorter time-to-market, and cost savings. It provides users with an efficient and reliable way to detect a wide range of defects, enabling a higher quality product that meets industrial standards and customer needs. Furthermore, the asset's advanced defect engine and image stitching capabilities help users to quickly analyze and visualize the effects of defects, leading to more accurate and timely implementation of defect-prevention measures.